Tata Institute of Fundamental Research
Phase Shifting Masks for Microlithography
Student Seminar
Speaker:
Tapan Shah
Organiser:
John Barretto
Date:
Friday, 18 May 2012, 15:00 to 16:30
Venue:
A-212 (STCS Seminar Room)
(Scan to add to calendar)
Abstract:
I will introduce the problem of mask design in a lithographic process from a systems perspective and show how it can be reduced to a non-linear optimization problem. I will also show the benefit of phase shift mask over the binary mask with some examples. Lastly, I will show how a complex mask can be replaced by successive real valued masks (double exposure theorem).
| Speaker: | Tapan Shah |
| Organiser: | John Barretto |
| Date: | Friday, 18 May 2012, 15:00 to 16:30 |
| Venue: | A-212 (STCS Seminar Room) |
(Scan to add to calendar)
Abstract:
I will introduce the problem of mask design in a lithographic process from a systems perspective and show how it can be reduced to a non-linear optimization problem. I will also show the benefit of phase shift mask over the binary mask with some examples. Lastly, I will show how a complex mask can be replaced by successive real valued masks (double exposure theorem).